ERAGON ENVIRO TECH. goes beyond conventional “treat and discharge” models by transforming wastewater into a valuable resource.
Leveraging technologies such as HEIC Heavy Metal Recovery, HPNF/RO, and ED/BPED Salt-to-Acid/Base Conversion, we have built a comprehensive resource recovery system. Through adsorption, regeneration, purification, and separation processes, we recover by-products such as acids, alkalis, fluorite, calcium chloride, and elemental metals — which can be reused in production or sold into the market.
Our engineering experience has enabled us to upgrade client wastewater treatment plants into resource recovery centers, turning cost centers into value-creating assets. This innovative model reduces environmental costs while enhancing overall economic benefits, positioning ERAGON ENVIRO TECH. as a leader in sustainable resource utilization.
ERAGON ENVIRO TECH. delivers stable, efficient, and energy-saving pure water / ultrapure water solutions through the synergistic operation of three core systems: Pre-treatment System, Make-up System, and Polishing System. These systems comprehensively meet the stringent water quality requirements of high-precision manufacturing.
The Pre-treatment System, as the first line of defense in water purification, combines multimedia filtration, activated carbon adsorption, and precision filtration to effectively remove suspended solids, colloids, organics, and residual chlorine from raw water. This ensures stable inlet quality for downstream processes while reducing system load, enhancing overall energy efficiency from the source.
The Make-up System employs advanced technologies such as reverse osmosis (RO) and EDI for deep purification. With precise process control and intelligent operation, it significantly reduces energy and chemical consumption, while producing high-purity water efficiently and enabling water recycling, improving system-wide operational efficiency.
The Polishing System, as the final purification step, applies ultra-fine filtration and ion exchange to remove trace ions and particles, delivering ultrapure water with a resistivity up to 18.2 MΩ·cm, fully meeting the extreme water quality demands of the semiconductor and other high-tech industries.
This solution has been successfully implemented in numerous semiconductor projects across China and exported to global markets, earning wide recognition for its stability, efficiency, and reliable water quality performance.